Automatic angle adjusting mechanism in addition to the basic spectrum ellipsometry system enables high accurate film thickness measurement for variety of thicknesses. Detachable retarder and rotating analyzer also widens the scope of choices available to measure as well as improves the measurement accuracy.

FEATURES:

• Ellipsometry measurement for both visible and ultraviolet-ray range (250-800nm)
• Nano-order thin film thickness
• Quick measurement using multi channel spectroscopy (over 400ch)
• Angle adjustable mechanism for detailed analysis
• High operability with optical constant database and recipe registration function
• Optical constant measurement using multi layer fitting analysis for quality control of film thickness and film property

MEASURE ITEM:

• Ellipso-parameters (tanψ、cosΔ)
• Optical constant analysis (n : reflactive index , k : extinction coefficient )
• Thickness analysis