A film thickness measurement system based on the microscopic spectrophotometry features the availability of non-contact and non-destructive measurements with high accuracy and high reproducibility. These systems are widely used in different fields including the semiconductor, flat panel display and other various electronic optical materials.

FEATURES:

• Light interference thickness monitor for thickness and optical constant analysis of multi layers using reflection spectrum between UV to NIR light.
• Adoption of spectroscopy enables non-contact, non-destructive, highly precise, highly reproducible thickness measurement
• Wide wavelength range(190nm – 1600nm)
• Wide film thickness range （1nm～1mm)
• Microscopic function (Min φ3μm) enables measurement of patterned sample and rough surface sample

MEASURE  ITEM

• Absolute reflectance
• Film thickness
• Optical constant (n: Refractive index, k: Extinction coefficient)